Atmospheric Pressure Remote Plasma Device "RT"
Damage-free with low-temperature treatment and electric field shielding structure! It is adopted in many production processes, including LCD factories.
The "RT" is an atmospheric pressure remote plasma device with low-temperature processing and electric field shielding structure. It achieves processing at high speed (10m/min) below 10° (for processing glass substrates for LCDs). We offer a wide range of options accommodating widths from 160 to 3400mm. In the LCD field, it is used for improving the wettability of glass surfaces and enhancing wet cleaning effects. In the touch panel and OLED fields, it is used for surface modification of conductive films and pre-treatment for lamination. 【Features】 ■ Damage-free ■ High processing performance ■ Wide range of options ■ Numerous proven results ■ Supported widths: 160 to 3400mm ■ Utilities: power supply, processing gases (N2, CDA), exhaust, cooling water *For more details, please refer to the PDF document or feel free to contact us.
- 企業：積水化学工業 P2事業推進部
- 価格：Other
